Tailored waveform generator | Prodrive Technologies

Tailored bias waveform generator for decoupled plasma ion energy and density control during etching and deposition.

As semiconductor devices continue to scale, plasma etching and deposition processes require tighter control over ion energy and plasma density. Maintaining that control is essential for achieving smaller features and stable process performance.

Prodrive Technologies developed the tailored waveform generator – Axiom for advanced plasma biasing in etch and deposition applications. It enables tailored bias waveforms to support more accurate process control while helping reduce system complexity.